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Two step method for the deposition of AlN by radio frequency sputtering

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Figure

Fig. 1. (a) FWHM of the rocking curve of the AlN­(0002) x­ray reflection and RMS surface roughness of a 1 × 1 μm 2 scanned area as a function of the RF power for AlN layers  depos-ited on c-sapphire at a sputtering pressure of 0.47 Pa and T subs = 400 °C
Fig. 4. HRXRD 2θ/ω­scans for AlN films deposited under various substrate bias conditions:
Fig. 5. AFM images of 120­nm­thick AlN deposited on sapphire (a) at floating substrate conditions; (b) at −15 V of reverse bias; and (c) at −15 V biased substrate conditions on 30­nm­thick unbiased AlN buffer layer

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