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Dual radio frequency plasma source: Understanding via electrical asymmetry effect

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Figure

FIG. 2. Time evolution of the 2f CCRF applied rf voltage V(t) and rf current I(t) for f LF ¼ 13.56 MHz, V LF ¼ V HF ¼ 200 V, and different values of f HF
FIG. 5. Variation of g total with f HF for V LF ¼ V HF ¼ 200 V showing the local maxima at certain values of n at (a) 4, (b) 4.5, (c) 5, and (d) 5.5.

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