• No se han encontrado resultados

1. In summary, we have demonstrated reproducible bipolar resistivity switching

of the SiO2-Pt device. The switching is purely electronic: the insulator to metal

transition can be triggered by UV irradiation, which can be explained by

detrapping electrons from the mixture film.

2. In addition, it is a bulk switching mechanism rather than an interface

switching phenomenon, given the symmetric, linear I-V behavior.

3. The yield can reach 100% in device fabrication once the Pt concentration and

the film thickness are optimized.

4. The fastest switching speed achieved so far is 25 ns, which is presently limited by circuit‘s RC time, below which the excitation voltage pulse is distorted and does not rise to the prescribed value promptly.

5. The device can retain their resistance state giving no indication of decay, it

also possess constant switching parameters during repeated switching and

under different switching modes.

138

breakdown at voltages that well exceed the values required for switching

operation. These excellent intrinsic properties augur well for the consideration

of our device as a strong candidate for future RRAM devices.

VI. References

1

Flash memory: towards single electronics, A. Thean, and J. P. Leburton, IEEE, 0278- 6648, 35-41 (2002).

2

Switching properties of thin Nio films, J. F. Gibbons, and W. E. Beadle, Solid-State Electronics, 7, 785-797 (1964).

3

New conduction and reversible memory phenomena in thin insulating films, J. G. Simmons and R. R. Verderber, Proceedings of the Royal Society of London Series a- Mathematical and Physical sciences, 301, 77-102 (1967).

4

Switching phenomena in titanium oxide thin films, F. Argall, Solid-State Electronics,

11, 535-541 (1968).

5

The Missing Memristor Found, D. B. Strukov, G. S. Snider, D. R. Stewart, and R. S. Williams, Nature, 453, 80-83 (2008).

6

Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition, B. J. Choi, D. S. Jeong, S. K. Kim, S. Choi, J. H. Oh, C. Rohde, H. J. Kim, C. S. Hwang, K. Szot, R. Waser, B. Reichenberg, and S. Tiedke, J. Appl. Phys.,98, 033715 (2005).

7

Electromigration effect of Ni electrodes on the resistive switching characteristics of NiO thin films, C. B. Lee, B. S. Kang, M. J. Lee, S. E. Ahn, G. Stefanovich, W. X. Xianyu, K. H. Kim, J. H. Hur, H. X. Yin, Y. Park, and I. K. Yoo, Appl. Phys. Lett.,91, 082104 (2007).

139

8

Resistive switching of aluminum oxide for flexible memory, S. Kim, and Y-K. Choi, Appl. Phys. Lett.,92, 223508 (2008).

9

Memory effect of RF sputtered ZrO2 thin films, C-Y. Lin, C-Y. Wu, C-Y. Wu, C.-C. Lin, and T-Y. Tseng, Thin Solid Films, 516, 444–448 (2007).

10

Bipolar and unipolar resistive switching in Cu-doped SiO2, C. Schindler, S. C. P. Thermadam, and R. Waser , IEEE Tran. Elec. Devi.,54, 2762-2768, (2007).

11

Switching the electrical resistance of individual dislocations in single-crystalline SrTiO3, K. Szot, W. Speier,G. Bihlmayer, and R. Waser, Nature Mater. 5, 312–320 (2006).

12

PCMO Device with High Switching Stability, Y. Chen, W. Tian, H. Li, X. Wang, and W. Zhu, IEEE Elec. Dev. Lett., 31, 866-868 (2010).

13

Organic Materials and Thin Film Structures for Cross Point Memory Cells Based on Trapping in Meetallic Nanoparticles, L. D. Bozano, B. W. Kean, M. Beinhoff, K. R. Carter, P. M. Rice, and J. C. Scott, Adv. Func. Mat.,15, 1933-1939 (2005).

14

Nanoionics-based resistive switching memories, R. Waser, and M. Aono, Nature Materials, 6, 833-840 (2007).

15

Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges, R. Waser, R. Dittmann, G. Staikov and K. Szot, Advanced Materials,

21, 2632-2663 (2009).

16

Fractal dimension of conducting paths in Nickel oxide (NiO) thin films during resistance switching, In K. Yoo, B. So. Kang, S. E. Ahn, C. B. Lee, M. J. Lee, G-S. Park, and X-S. Li, IEEE transactions on nanotechnology, 9, 2 (2010).

17

Electrical-stress-indeuced conductivity increase in SrTiO3 films, S. Karg, G. I. Meijer, D. Widmer, and J. G. Bednorz, Appl. Phys. Lett.,89, 072106 (2006).

18

Characteristic electroforming behavior in Pt/TiO2/Pt resistive switching cells depending on atmosphere, D. S. Jeong, H. Schroeder, U. B., and R. Waser, J. Appl. Phys.,104, 123716 (2008).

140

19

Resistance switching study of stoichiometric ZrO2 films for non-volatile memory application, P. Zhou, H. Shen, J. Li, L.Y. Chen, C. Gao, Y. Lin, and T.A. Tang, Thin Solid Films, 518, 5652–5655 (2010).

20

Nanosphere: Nanoscale resistive switching and filamentary conduction in NiO films, J. Y. Ye, Y. Q. Li, J. Gao, H. Y. Peng, S. X. Wu, and T, Wu, Appl. Phys. Lett., 97, 132108 (2010).

21

Overview of candidate device technologies for storage-class memory, G. W. Burr, B. N. Kurdi, J. C. Scott, C. H. Lam, K. Gopalakrisnan, and R. S. Shenoy, IBM J. Res. & Dev., 52, 449-464 (2008).

22

Current Activity for 0.1Tb Nonvolatile Memory Development, J. G. Park, J. H. Lee, H. S. Huang, B. K. Cheong, ITRS 2003.

23

Voltage-time dilemma of pure electronic mechanisms in resistive switching

memory cells, H. Schroeder, V. V. Zhirnov, R. K. Cavin, and R. Waser, J. Appl. Phys.,

107, 054517 (2010).

24

Low Power and High Speed Switching of Ti-doped NiO ReRAM under the Unipolar Voltage Source of less than 3 V, K. Tsunoda, K. Kinoshita, H. Noshiro, Y. Yamazaki, T. Jizuka, Y. Ito, A. Takahashi, A. Okano, Y. Sato, T. Fukano, M. Aoki, and Y. Sugiyama, IEEE, p.767 (2007).

25

Resistance switching study of stoichiometric ZrO2 films for non-volatile memory application, P. Zhou, H. Shen, J. Li, L.Y. Chen, C. Gao, Y. Lin, T.A. Tang, Thin Solid Films,518, 5652–5655(2010).

26

High speed resistive switching in Pt/TiO2 /TiN film for nonvolatile memory application, C. Yoshida, K. Tsunoda, H. Noshiro, and Y. Sugiyama, Appl. Phys. Lett.,

91, 223510 (2007). 27

Low Power and High Speed Bipolar Switching with A Thin Reactive Ti Buffer Layer in Robust HfO2 Based RRAM, H. Y. Lee, P. S. Chen, T. Y. Wu, Y. S. Chen, C. C. Wang, P. J. Tzeng, C. H. Lin, F. Chen, C. H. Lien, and M. J. Tsai, IEDM 2008.

141 28

Bias polarity dependent data retention of resistive random access memory consisting of binary transition metal oxide, K. Kinoshita, T. Tamura, M. Aoki, Y. Sugiyama, and H. Tanaka, Appl. Phys. Lett.,89, 103509 (2006).

29

Deep levels and persistent photoconductivity in GaN thin films, C. H. Qiu, and J. I. Pankove, Appl. Phys. Lett.,70, 1981-2985 (1997).

30

ZnO Nanowire UV Photodetectors with High Internal Gain, C. Soci, A. Zhang, B. Xiang, S. A. Dayeh, D. P. R. Aplin, J. Park, X. Y. Bao, Y. H. Lo, and D. Wang, Nano Letters, 7, 1003-1009 (2007).

31

Resistance switching in the metal deficient-type oxides: NiO and CoO, H. Shima, F. Takano, H. Akinaga, Y. Tamai, I. H. Inoue, and H. Takagi, Appl. Phys. Lett.,91, 012901 (2007).

32

Microstructure and resistance switching in NiO binary oxide films obtained from Ni oxidation, L. Courtade, Ch. Turquat, Ch. Muller, J. G. Lisoni, L. Goux, D. J. Wouters, and D. Goguenheim, IEEE Proceeding of Non Volatile Memory ,94-99 (2006).

33

Study on the resistive switching time of TiO2 thin films, B. Choi, S. Choi, K. M. Kim, Y. C. Shin, C. S. Hwang, S-Y. Hwang, S-s. Cho, S. Park, and S-K. Hong, Appl. Phys. Lett.,89, 012906 (2006).

34

Solid-state electrochemistry in molecule/TiO2 molecular heterojunctions as the basis of the TiO2 ‗memristor‘, J. Wu, and R. L. McCreery, J. Electrochem. Soc.,156, P29–P37 (2009).

35

Effect of ultraviolet illumination on resistive switchingproperties of CuxO thin film, C-Y. Liu, and J-M. Hsu, Jpn J. Appl. Phys.,49, 084202 (2010).

36

Temperature dependence of high- and low-resistance bistable states in

polycrystalline NiO films, K. Jung, H. Seo, Y. Kim, H. Im, and J. Hong, Appl. Phys. Lett.,90, 052104 (2007).

37

Resistive Switching Properties of SrZrO3-Based Memory Films, C. C. Lin, C. C. Lin, B. C. Tu, J. S. Yu, C. H. Lin, and T. Y. Tseng, Japanese Journal of Applied Physcis, 46, 2153-2156 (2007).

142

38

Resistive switching properties in oxygen-deficient Pr0. 7Ca0. 3MnO3 junctions with active Al top,S. L. Li, D. S. Shang, J. Li, J. L. Gang, and D. N. Zheng, J. Appl. Phys.,

105, 033710 (2009).

39

Excellent resistance switching characteristics of Pt/SrTiO3/Schottky junction for multi-bit nonvolatile memory application, H. Sim, H. Choi, D. Lee, M. Chang, D.Choi, Y. Son, E-H. Lee, W. Kim, Y. Park, I-K. Yoo, and H. Hwang, IEDM Tech. Digest, 758-761 (2005).

40

Interface resistance switching at a few nanometer thick perovskite manganite active layers, A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett.,88, 232112 (2006).

143

Documento similar