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... the multilayer TiN/TiCN/TiC thin films deposited on CP-Ti, Ti6Al4V and silicon substrates were observed by Quanta 250 FEG model scanning electron ... See full document

... TiN films are commercially important due to their high hardness, high thermal, chemical stability and wear resistance ...material, TiN films usually are deposited on Titanium, steel and ... See full document

... tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel ...The microstructure of the coatings was evaluated using (SEM), and phase formation was ... See full document

... The TiN thin films were deposited by reactive radio frequency (RF) magnetron sputtering method on Al substrates. The deposition was carried out a pressure inside the chamber was ... See full document

... For multilayer coatings and as proposed by authors such as WF Piedrahita and collaborators [15] it was evident that the predominant mechanism was an adhesive type wear and when the number of bilayers increased, as ... See full document

... the mechanical properties changing with respect to the indentation depth can be ...BFO thin films, nanoindentation was conducted on the standard fused silica sample to obtain the reasonable ... See full document

... sputter deposited for 20, 30, and 40 min, ...thinner films were favored, yet they still had to be optically thick (thickness greater than 100 nm for ...as-deposited films using spectroscopic ... See full document

... tron sputtering technique on glass substrates at room ...these films as a function of annealing temperature at the ...optical properties of these films, such as the transmittance, T(λ), and ... See full document

... CZTS thin films are generally prepared by thermally activated processes like evaporation and sequential processing which is comprised of deposition of the alloy precursors followed by post- ...be ... See full document

... chromogenic properties of molybdenum oxide on the one hand and the catalytic properties of gold nanoparticles on the other, a binary system that is formed by molybdenum oxide coated with gold nanoparticles ... See full document

... During magnetron sputtering without applying a substrate bias a strong ion mixing process isn’t ...dense microstructure of films deposited at room temperature substrates may be caused ... See full document

... scanning electron microscopy (SEM) technique was a Hitachi S4160.More uniform grains may lead to more protection results, via the surface morphologies. Cross section have been analyzed via a Zeiss Supra 55VP ... See full document

... In another widely studied class of DMSs, a 3d-transition metal is used to dope a III-V semiconductor. One existing theory for these III-V DMS is based on the indirect exchange between the local magnetic moments, for ... See full document

... the sputtering target, which drives the current “I”, depends upon the gas pressure “P” in the vacuum chamber ...as sputtering yield also decides the amount of sputtering atoms, voltage “V” also plays ... See full document

... (ZnO) thin films have been widely studied for applica- tions such as transparent conductive oxides (TCOs) ...indium tin oxide (ITO) is one of the TCOs that are mostly used in optoelectronic devices, ... See full document

... sited films. Determining thermoelectric properties of Ca- Co-O film showed the low Seebeck coefficient and high electrical resistivity, which leaded to a low power ... See full document

... Cu thin films were deposited on Si(100) substrates using direct current (DC) magnetron ...of sputtering DC power on the electrical, structural properties, and the nucleation and growth ... See full document

... thickness, refraction and absorption coefficients of the layers prepared at 150 and 340 W totally increase with increasing power from 150 to 340 W because the dominant phase in these layers is a Cu 2 O phase and these ... See full document

... the sputtering yield the RF power was maintained at 140 W where the observed deposition rate was 150 ...the films grown on flexible substrate is a positive observation for electro- chemical ...4 ... See full document

... mbar.The films deposited at nitrogen partial pressure of 6x10 -3 mbar exhibited homogeneous surface with small grains without cracks and ...The films deposited at higher nitrogen partial ... See full document